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Gridless Ion Beam Source Supply

Active

Federal

Response Deadline09/26/2026, 12:00:00 AM UTC

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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This subcontract involves the supply of a high-current gridless ion beam source for prime contractors working on LBNL Advanced Light Source projects under the Department of Energy. The requirement is for one unit of hardware equivalent to the KRI EH1000 10 A, which must meet all technical specifications necessary for thin-film deposition. The procurement is categorized under NAICS code 334413 and is managed by Berkeley National Labor. The solicitation was posted on September 17, 2026, with a response deadline of September 26, 2026. Performance of the contract will take place in the 94720 zip code area.

General Info

Supply one KRI EH1000 ion beam source for LBNL Advanced Light Source projects.

Agency

Department Of Energy → Berkeley National Labor - DOE ContractorView Agency

NAICS

334413 - Semiconductor and Related Device ManufacturingView NAICS

Place of Performance

CA, 94720, USA

Set-Aside

NONE

Documents

This scope was carved out of KT-2026-01.

The full solicitation package (1 document), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Custom High-Vacuum E-Beam Evaporation System

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Timeline

PostedSep 17

subcontract

Response DeadlineSep 26

Submission deadline

Response Deadline

09/26/2026, 12:00:00 AM UTCin 5 days

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Organization & Contact Information

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AgencyDepartment Of Energy → Berkeley National Labor - DOE Contractor

ContactsNo contacts available

OfficeN/A

Organization / Agency

Department Of Energy → Berkeley National Labor - DOE Contractor

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Office AddressN/A

ContactsNo contact information available

Full Description

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Supplies a high-current gridless ion beam source for prime contractors on LBNL Advanced Light Source projects. Provides hardware equivalent to the KRI EH1000 10 A, ensuring compliance with technical specifications for thin-film deposition. Delivers one gridless ion beam source unit.

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