Custom High-Vacuum E-Beam Evaporation System

The Lawrence Berkeley National Laboratory Advanced Light Source Division is conducting market research via a Request for Information to identify sources capable of providing a Custom High-Vacuum E-Beam Evaporation System, including installation. This system is intended to support beamline instrumentation and experiments by enabling precise, high-purity thin-film deposition for samples, optics, and detector components. The project is categorized under NAICS code 333242 and is managed by the Department of Energy through the Berkeley National Labor DOE Contractor. Technical requirements for the system include a nominal throw distance of approximately 1.0 meter, a dedicated substrate load-lock for items up to 200 mm x 40 mm x 50 mm to avoid venting the main chamber, and an integrated motorized tilt stage for in-situ angled deposition. The system must simultaneously accommodate two ion sources, specifically a gridded ion source and a gridless ion beam source. Physical constraints limit the system to 8 feet in length, 7 feet in width, and 7.5 feet in height, with electrical requirements not exceeding 208 V three phase and 100 A. This effort is currently for informational and planning purposes only and does not constitute a formal solicitation or a request for a quote. Interested respondents must submit relevant product literature, technical specifications, and the country of origin of manufacture to Karen Tays by September 25, 2026. No set-aside has been designated for this research, and the small business size standard is defined as 1,500 or fewer employees.