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This Government Contract opportunity from National Aeronautics And Space Administration was posted on July 6, 2026. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Post-Etch Solvent Cleaning and Surface Preparation

Closed
Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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NAICS: 339112
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245-NETWORK Contract Office 5 (36C245)

POSTED

about 19 hours ago

DEADLINE

in 2 days

AI Contract Overview

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The contract titled Post-Etch Solvent Cleaning and Surface Preparation requires the removal of etch residues, mask remnants, and other contaminants from microfabricated components using solvent-based cleaning methods that preserve the integrity of delicate etched features and diaphragm structures. The work must be performed with precision to avoid any damage to sensitive surface topographies, ensuring the final components meet stringent quality standards for use in advanced aerospace applications. Cleaning protocols must be validated to guarantee consistency, repeatability, and compatibility with the materials involved, without introducing new particulates or chemical residues. This subcontract, issued by the NASA Shared Services Center under the National Aeronautics and Space Administration, is classified under NAICS code 339112 and was posted on July 6, 2026, with responses due by July 10, 2026. The place of performance details are not specified, and no set-aside provisions or point of contact information are provided. The opportunity is accessible via the SAM.gov platform and is intended for qualified subcontractors capable of executing high-precision surface preparation in a controlled environment suitable for aerospace-grade microsystems.

General Info

Precision solvent cleaning of microfabricated aerospace components to remove contaminants without damage.

Agency

National Aeronautics And Space Administration → NASA Shared Services CenterView Agency

NAICS

339112 - Surgical and Medical Instrument ManufacturingView NAICS

Place of Performance

MS

Set-Aside

NONE

Documents

This scope was carved out of 80NSSC26936816Q.

The full solicitation package (1 document), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Dry etching of Combined Gallium Nitride Epitaxial Layer and Silicon Carbide Substrate

AI Contract Breakdown

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Timeline

PhaseClosed
Posted

subcontract

Response Deadline

Deadline has passed

Submission Closed

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Organization & Contact Information

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AgencyNational Aeronautics And Space Administration → NASA Shared Services Center
ContactsNo contacts available
OfficeN/A
Organization / Agency
National Aeronautics And Space Administration → NASA Shared Services Center
View Agency Profile
Office AddressN/A
ContactsNo contact information available

Full Description

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Remove etch residues, mask remnants, and contaminants using solvent cleaning without damaging etched features or diaphragm structure.

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