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This Government Contract opportunity from Department Of Defense was posted on April 13, 2020. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Rapid Assured Microelectronics Prototypes using Advanced Commercial Capabilities (RAMP) (S2MARTS)

Closed
N0016420SNB50Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

Active Opportunities Like This One

NAICS: 541713
SBIR / STTR
Development of Ultrafast Nonvolatile Memory Based on Sliding Ferroelectricity in Moiré Polar Homostructures
Solicitation # OSW26TZ06-NV005
Solicitation OSW26TZ06-NV005, issued by the Office of the Secretary of Defense, seeks the development of ultrafast, high-endurance, nonvolatile memory technology utilizing sliding ferroelectricity in polar moiré van der Waals homostructures. The objective is to create memory devices that outperform current technologies in speed, endurance, and scalability by leveraging engineered nanoscale polar domains. The project aims for dual-use applications, specifically targeting edge computing, neuromorphic computing, and radiation-tolerant electronics. Performance will be measured by switching speed, switching energy, endurance, retention, readout fidelity, and device-to-device reproducibility. This is a total small business set-aside under the SBIR/STTR mandate for companies with fewer than 500 employees. The contract is structured in phases, with a Phase II base period of 10 to 12 months not to exceed 1,000,000 dollars, and an optional period of 10 to 12 months for an additional 1,000,000 dollars. Awardees may also request up to 50,000 dollars in Discretionary Technical and Business Assistance. Proposals must be submitted via the Defense SBIR/STTR Innovation Portal by October 21, 2026, and will be evaluated based on technical merit, innovation, investigator qualifications, and commercialization potential. Compliance with CMMC and DFARS cybersecurity standards is required to safeguard federal contract information.
Office of the Secretary of Defense

POSTED

about 2 months ago

DEADLINE

in about 5 hours
NAICS: 541713
SBIR / STTR
Engineered Microstructures for Enhanced IR Aperture Performance
Solicitation # OSW26BZ06-NV024
The Office of the Secretary of Defense, through the Office of the Secretary of War, is soliciting proposals under the Small Business Innovation Research program for the development of engineered microstructures to enhance infrared aperture performance. The project seeks innovative powder synthesis and consolidation methods to produce IR-transparent composite ceramics at a scale exceeding 2 by 4 by 0.5 inches, with a long-term goal of producing components in the 3 by 9 inch range or larger. To be suitable for transition, the material must achieve sub-100 nm microstructural features in all phases, porosity below 0.1 percent, and Short-Wave to Mid-Wave Infrared transparency of at least 80 percent. Additionally, the composite must maintain these properties after exposure to 1200 degrees Celsius for 10 minutes and meet a thermal expansion to thermal conductivity ratio of 1.0 micrometers per Watt or less at 1000 degrees Celsius, with a target of 0.5 micrometers per Watt. This solicitation, numbered OSW26BZ06-NV024, is set aside for Small Business Concerns and offers a Phase I base value of 300,000 dollars over a 12-month period of performance, with potential additional TABA funding up to 6,500 dollars. Proposals must be submitted via the Defense SBIR STTR Innovation Portal by October 21, 2026, and must include seven specific volumes covering technical, cost, commercialization, and disclosure data. Awardees are required to maintain active registrations in SAM and the SBA Company Registry and must comply with DFARS 252.204-7012 for safeguarding covered defense information. The government will evaluate the work based on high professional standards, utilizing X-ray diffraction and scanning electron microscopy with energy dispersive spectroscopy to verify technical specifications.
Office of the Secretary of Defense

POSTED

about 2 months ago

DEADLINE

in about 5 hours
NAICS: 541713
SBIR / STTR
Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER)
Solicitation # DPA26TZ06-DV004
The Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER) project is a Small Business Technology Transfer (STTR) solicitation issued by the Defense Advanced Research Projects Agency (DARPA). The objective is to develop innovative nanofabrication hard-mask materials that overcome the physical limitations of current state-of-the-art inorganic films and sputtered metals. The goal is to enable the creation of extreme high-aspect-ratio structures, specifically targeting a 100:1 ratio, with minimal sidewall roughness and precise dimensional control. These materials are intended for use across various platforms, including semiconductor, photonic, MEMS, and quantum devices, and should be compatible with standard plasma fabrication tools such as RIE, ICP, and Bosch Deep RIE. This total small business set-aside opportunity offers a primary award value of 1,500,000 dollars over a 24-month period of performance, with an additional 12-month option valued at 450,000 dollars. Proposers may also be eligible for TABA funding of up to 6,500 dollars in Phase I and 50,000 dollars in Phase II. Proposals will be evaluated on their own individual merit based on technical merit, investigator qualifications, and commercial potential. Submissions must be made via the Defense Solutions Innovation Portal by October 21, 2026. Awardees must adhere to strict security requirements, including CMMC Level 2 self-assessment certification for those handling controlled unclassified information or ITAR-regulated work.
Defense Advanced Research Projects Agency

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about 2 months ago

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NAICS: 541713
SBIR / STTR
Monolithic Graphene–CMOS Broadband (UV-LWIR) Focal Plane Arrays for target detection in low-light conditions
Solicitation # OSW26BZ06-DV027
Solicitation OSW26BZ06-DV027 is a Small Business Innovation Research (SBIR) effort issued by the Office of the Secretary of Defense to develop a wafer-scale, monolithically integrated graphene-on-CMOS image sensor. The project aims to create a compact, low-power, uncooled focal plane array capable of broadband imaging from 300 nm to 10,000 nm (UV-LWIR) to enhance naval ISR target detection in low-light conditions. The primary technical objective is to retire risks associated with graphene material quality, high-yield back-end-of-line transfer, and absorber sensitization, with a specific performance goal of increasing integrated-device carrier mobility to approximately 10,000 cm²/V·s. This Direct to Phase II award has an estimated value of 2,000,000 dollars with a base period of performance of 24 months. Proposals will be evaluated based on technical approach, qualifications of key personnel, and commercial potential, with the contract likely taking the form of a Firm-Fixed-Price or Cost-Plus-Fixed-Fee agreement. Awardees must comply with strict cybersecurity and data safeguarding requirements, including R-DFARS 252.204-7012 and CMMC Phase I self-assessment standards. Submissions must be made via the DSIP portal and include comprehensive technical, cost, and commercialization volumes.
Office of the Secretary of Defense

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about 2 months ago

DEADLINE

in about 5 hours
NAICS: 541713
SBIR / STTR
Scalable Processing of Large Area, Oriented 2-Dimensional Polymer Films
Solicitation # OSW26TZ06-NV007
Solicitation OSW26TZ06-NV007, issued by the Office of the Secretary of Defense, seeks a scalable and cost-effective method to produce large-area, oriented 2-dimensional polymer (2DP) ensemble films, such as covalent organic frameworks. The primary objective is to overcome current processing limitations that result in insoluble powders or mechanically weak films by developing a process amenable to roll-to-roll manufacturing. The goal is to achieve high structural order and orientation of individual sheets perpendicular to the film plane while minimizing defects like pinholes and stacking errors. The project is structured in three phases: Phase I requires a continuous process producing films 1-50 microns thick at a rate of 100 feet per minute; Phase II aims to increase deposition rates by 2-5 times; and Phase III focuses on scaling to manufacturing-relevant levels with highly aligned domains. This is a Total Small Business Set-Aside under the STTR program, requiring proposing firms to be registered in SAM and the SBA Company Registry. Proposals must be submitted via the Defense SBIR/STTR Innovation Portal by October 21, 2026. Evaluation is based on technical merit, innovation, personnel qualifications, and commercialization potential, with technical soundness being the most important factor. Awardees must comply with strict cybersecurity standards, including CMMC and NIST SP 800-171/172, and provide an intellectual property agreement between the small business and its research partner. All work is expected to be performed at the unclassified level and is subject to government inspection to ensure high professional standards.
Office of the Secretary of Defense

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about 2 months ago

DEADLINE

in about 5 hours

General Info

NAICS

541713 - Research and Development in Nanotechnology

Place of Performance

IN

Set-Aside

NONE

Documents

0

No documents available

Documents will appear here when they are available.

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Timeline

1 update
PhaseClosed
Posted

special-notice

Notice updated

Response deadline changed from May 14, 2020 to May 29, 2020. The notice description changed.

Response Deadline

Deadline has passed

Submission Closed

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Organization & Contact Information

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AgencyDepartment Of Defense → Nswc Crane
Contacts2 people available
OfficeCRANE, IN, 47522-5001, USA
Office AddressCRANE, IN, 47522-5001, USA

Full Description

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AMENDMENT 0001: The date for receipt of solutions has been extended to 29 May 20 at 12:00 ET. Special Notice N0016420SNB50 Agency: Department of the Navy Office: Naval Sea Systems Command Location: NSWC Crane Division Classification Code: AD93 OCC 255 NAICS Code: 541713 Research & Development in Nanotechnology Response Due Date: 14 May 2020 Request for Solutions: Rapid Assured Microelectronics Prototypes using Advanced Commercial Capabilities (RAMP) (S2MARTS) 1. PURPOSE This Request for Solutions (RFS) is issued to locate capable vendors with the ability to develop integrated circuit (IC) hardware and workflow prototypes that promote the use of assurance principles, feature protection, and correlation. The purpose of this prototype is to facilitate the rapid development of IC hardware for further evaluation and technology enablement of DoD, while simultaneously generating workflow prototypes using commercial best practices for DoD Defense Industrial Base (DIB). It will also address brand new technology development that will provide DoD relevant IC prototypes utilizing advanced node fabrication mitigating the need for International Traffic in Arms Regulations (ITAR) fabrication. The Government will evaluate the solutions with the intent of awarding an Other Transaction Agreement (OTA) in accordance with 10 U.S. Code - 2371b. In accordance with 10 U.S.C. 2371b(f), and upon a determination that the prototype project (or any subsequent iterative prototyping efforts) was successfully completed under the competitively awarded OTA(s), a follow-on production contract(s) or OTA(s) may be awarded without the use of competitive procedures. 2. BACKGROUND AND SUMMARY 2.1 S2MARTS Vendors interested in responding to this RFS must be members of the Strategic & Spectrum Missions Advanced Resilient Trusted Systems (S2MARTS) consortium. Interested parties may visit S2MARTS.org for membership information. This project will be managed by a Naval Surface Warfare Center, Crane Division Project Manager. 2.2 PROJECT OVERVIEW Currently, commercial industries and other non-DoD markets supersede the Department of Defense (DoD) and the traditional Defense Industrial Base (DIB) in the design and fabrications of SOTA ICs and System on a Chip (SoC). The RAMP project intends to address and replace the obsolete practices utilized by the United States Government in support of SOTA custom IC and SoC design, especially those associated with physical or - back-end design. Prototypes developed under this OTA should satisfy the technology objectives identified in the Request for Solutions document and be developed within the Department of Defense Architecture Framework structure for future approval to operate. Please visit the S2MARTS website https://s2marts.org/ to review the full RFS. Contracting Office Address: 300 Hwy 361 Crane, IN 47522 United States Primary Point of Contact.: Mary Beth McFann marybeth.mcfann@navy.mil Phone: 812-854-1686 Secondary Point of Contact: Dallas Parsley dallas.parsley@navy.mil Phone: 812-854-2239

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