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Thin Film Deposition (Quartz and Metallization)

Active

Federal

Response Deadline08/17/2026, 08:00:00 PM UTC

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

AI Contract Overview

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This subcontract opportunity with the National Aeronautics And Space Administration, managed through the NASA Shared Services Center, focuses on the deposition of silicon dioxide quartz and metal layers. The project requires the use of PVD, CVD, or ALD techniques to achieve hierarchical metallization on silicon carbide substrates. The solicitation is categorized under NAICS code 334419. Interested parties must submit their responses by August 17, 2026, following the posting date of August 12, 2026.

General Info

NASA subcontract for silicon dioxide and metal layer deposition on silicon carbide substrates.

Agency

National Aeronautics And Space Administration → NASA Shared Services CenterView Agency

NAICS

334419 - Other Electronic Component ManufacturingView NAICS

Place of Performance

MS

Set-Aside

NONE

Documents

This scope was carved out of 80NSSC26941665Q.

The full solicitation package (1 document), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Surface Micromachining of Single Crystal Silicon Carbide Sensors

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Timeline

PostedAug 12

subcontract

Response DeadlineAug 17

Submission deadline

Response Deadline

08/17/2026, 08:00:00 PM UTCin 4 days

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Organization & Contact Information

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AgencyNational Aeronautics And Space Administration → NASA Shared Services Center

ContactsNo contacts available

OfficeN/A

Organization / Agency

National Aeronautics And Space Administration → NASA Shared Services Center

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Office AddressN/A

ContactsNo contact information available

Full Description

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Deposition of silicon dioxide (quartz) and metal layers using PVD, CVD, or ALD techniques for hierarchical metallization on SiC.

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