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Plasma-Based Material Growth Technology

Active

Federal

Response Deadline06/30/2026, 11:59:00 PM UTC

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

AI Contract Overview

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This contract involves the development and integration of plasma-based control mechanisms specifically designed for crystal growth systems. The goal is to enable precise manipulation of atomic deposition processes without relying on traditional optical methods. This innovative approach aims to advance material growth technologies by leveraging plasma interactions to enhance control at the atomic level. Issued by the Defense Advanced Research Projects Agency under the Department of Defense, this subcontract falls under the NAICS code 334517, which relates to specialized manufacturing in semiconductor machinery and related equipment. The solicitation was posted on May 21, 2026, with a response deadline of June 30, 2026. While specific location details and points of contact are not provided, the contract targets cutting-edge research and development to support defense-related material science initiatives.

General Info

Develop plasma-based control for crystal growth, enhancing atomic precision in semiconductor manufacturing.

Agency

Department Of Defense → Defense Advanced Research Projects Agcy

NAICS

334517 - Irradiation Apparatus Manufacturing View NAICS

Place of Performance

VA

Set-Aside

NONE

Documents

(0)

No documents available

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Timeline

PostedMay 21

subcontract

Response DeadlineJun 30

Submission deadline

Response Deadline

06/30/2026, 11:59:00 PM UTCin 14 days

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Organization & Contact Information

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AgencyDepartment Of Defense → Defense Advanced Research Projects Agcy

ContactsNo contacts available

OfficeN/A

Organization / Agency

Department Of Defense → Defense Advanced Research Projects Agcy

Office AddressN/A

ContactsNo contact information available

Full Description

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Develop and integrate plasma-based control mechanisms into crystal growth systems to manipulate atomic deposition without optical methods.

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