Boulder EUV Source Use (Budget Mod Eval)

The Department of Commerce is forecasting a contract for the Boulder EUV Source Use to address the critical lack of industrial standards for characterizing extreme ultraviolet light, specifically regarding power and energy measurements. Because EUV lithography is essential for fabricating advanced semiconductor chips and requires high-wattage light generation, this initiative aims to establish necessary measurement capabilities. These capabilities will support both high-power lithography and lower-power support tools used for reflectivity and transmission measurements. This project will enable NIST to collaborate with industry partners to develop standardized power and energy measurement tools suitable for current and future semiconductor manufacturing needs. The work is slated for performance in Boulder and is categorized under NAICS code 334413. Interested parties can coordinate through the designated points of contact at the Department of Commerce and the CHIPS office.