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Light Conversion Carbide/Orpheus, NIR Laser

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Federal

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The Department of Commerce is forecasting a requirement for a Light Conversion Carbide/Orpheus NIR Laser to support the advancement of nanoscale thermal metrology. The project aims to develop innovative tools for mapping thermal conductivity and interfacial thermal conductance with high precision and significantly increased throughput. This technical objective will be pursued through the wide bandwidth detection of transient photothermal expansion using either super-resolution microscopes or NIST-made optomechanical AFM probes to achieve high-resolution mapping. This procurement is categorized under NAICS code 334413 and is associated with performance in Gaithersburg. Interested parties can coordinate with the point of contact, Nathali Medina, or the DOC Office of Small and Disadvantaged Business Utilization. The initiative focuses on overcoming current limitations in measuring thermal properties to enable the engineering of advanced and heterogeneously integrated devices.

General Info

Department of Commerce seeks NIR Laser for nanoscale thermal metrology in Gaithersburg.

Agency

Department of Commerce

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD, USA

Set-Aside

NONE

Documents

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Timeline

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forecast

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Organization & Contact Information

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AgencyDepartment of Commerce
Contacts2 people available
OfficeN/A
Organization / Agency
Department of Commerce
Office AddressN/A
Contacts

Full Description

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Precise measurements of thermal properties at the nanoscale are needed for engineering of advanced and heterogeneously integrated devices but are currently unattainable. We will radically advance thermal metrology by developing new tools for mapping thermal conductivity (¿) and interfacial thermal conductance (G) at the nanoscale, with high precision (¿¿<5%, ¿G<10%) and throughput (˜25·106improvement). This will be achieved by wide bandwidth detection of the transient photothermal expansion of a sample using either NIST-made optomechanical AFM probes (˜10¿nm resolution, 20 ms/pixel) or a far-field, super-resolution microscope (˜500 nm resolution, ˜5 µs/pixel, ˜100 µm depth sensitivity).

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