CW OPO laser source

The Department of Commerce is seeking a CW OPO laser source to support the development of advanced measurement technology, reference data, and materials for high-precision trace impurity gas analysis. The primary objective is to enable next-generation diagnostics capable of identifying impurities in process gases at sub-parts-per-billion levels. This initiative aims to facilitate the creation of industry-ready reference materials and point-of-use diagnostics, which are essential for achieving breakthroughs in critical tooling such as extreme ultra-violet lithography. By establishing a framework for impurity fingerprinting with traceability to new gas primary standards and documentary standards, the project will significantly enhance quality systems. The work is associated with NAICS code 334413 and is slated for performance in Gaithersburg. This forecast represents a strategic effort to improve metrology-grade data and diagnostic reliability for critical industrial applications.