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Photonic Probe Station

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Federal

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The Photonic Probe Station project, managed by the Department of Commerce under the CHIPS effort, focuses on advancing silicon photonics to enhance communication within information processing systems at the chip scale. The initiative aims to support the semiconductor ecosystem by addressing critical measurement needs essential for integrating photonic transceiver chips with processors. The scope of work is divided into two primary thrusts: creating specialized test structure designs and a general design methodology to optimize the extraction of material and device optical properties, and developing methods to measure and mitigate optical loss resulting from induced surface roughness. This forecast identifies Gaithersburg as the place of performance and falls under NAICS code 334413.

General Info

Commerce project advancing silicon photonics measurement and loss mitigation in Gaithersburg, NAICS 334413.

Agency

Department of Commerce

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD, USA

Set-Aside

NONE

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Organization & Contact Information

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AgencyDepartment of Commerce
Contacts2 people available
OfficeN/A
Organization / Agency
Department of Commerce
Office AddressN/A
Contacts

Full Description

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The length scale over which light is used for communication in information processing systems has steadily reduced. Silicon photonics is now crucial down to the chip scale, with major semiconductor companies such as Intel, Nvidia, and HP incorporating photonic transceiver chips with processors at the package level. To maximize the impact of silicon photonics for the semiconductor ecosystem, several measurement needs must be urgently addressed. Within this CHIPS effort, our team will focus on two thrusts that have been identified as key priorities by the integrated photonics industry: the development of specific test structure designs and a general design methodology that enable optimized measurements for extraction of device and material optical properties, and the measurement and mitigation of optical loss caused by induced surface roughness in photonic structures.

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