vector signal generator/arbitrary waveform

The Department of Commerce is forecasting a requirement for vector signal generators and arbitrary waveform equipment to support the advancement of plasma etching within the semiconductor manufacturing ecosystem. The project aims to address the nonlinear complexities of RF waveforms and plasma chemistry by developing RF waveform metrology and microsecond time-resolved frequency comb diagnostics. These tools are intended to improve the correlation between reactor inputs and etching outcomes, ensuring better consistency across tools and enabling real-time data generation for the design of next-generation processes. This initiative falls under NAICS code 334413 and will be performed in Boulder. The primary objective is to provide the industry with reliable RF calibration and in-situ monitoring capabilities to optimize semiconductor fabrication. Interested parties may coordinate with the Department of Commerce, specifically through the designated point of contact, Nathali Medina.