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Service contracts for KM Labs EUV HHG laser system

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Federal

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The Department of Commerce is forecasting service contracts for a KM Labs EUV HHG laser system to support the advancement of integrated circuits manufacturing. This initiative focuses on developing novel extreme ultraviolet optics, tabletop sources, and methodologies for inspection and process control, utilizing the 10 nm to 150 nm spectral range for chemical and dimensional characterization. By leveraging the SURF III synchrotron and compact in-lab sources, the project aims to significantly increase spatial resolution and material penetration, enhancing the volume of information gathered through fast optical techniques by a factor of 1000. The work will be performed in Gaithersburg and is categorized under NAICS code 334413. A primary goal of the project is the proactive transfer of these innovative metrological technologies to the U.S. industry through established and expanding partnerships. Interested parties can coordinate with the designated point of contact, Nathali Medina, regarding this forecast.

General Info

Commerce seeks service contracts for EUV HHG laser systems for integrated circuits manufacturing.

Agency

Department of Commerce

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD, USA

Set-Aside

NONE

Documents

0

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Timeline

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forecast

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Organization & Contact Information

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AgencyDepartment of Commerce
Contacts2 people available
OfficeN/A
Organization / Agency
Department of Commerce
Office AddressN/A
Contacts

Full Description

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We will use scatterometry to benefit advanced integrated circuits (IC) manufacturing. We propose to develop novel extreme ultraviolet (EUV) optics, tabletop sources, and methodologies for inspection and process control. This project will innovate novel approaches to utilizing the 10 nm to 150 nm spectral range for chemical and dimensional characterization of leading-edge technologies over the next decade. NIST is uniquely positioned as our SURF III synchrotron is an optimal source for this radiation, allowing parallel work on metrological aspects with an in-lab compact source. Through a combination of ten times greater spatial resolution in each dimension and the ability to penetrate materials using shorter wavelengths, we will achieve an increase in the information gathered through fast optical techniques by a factor of 1000. We will proactively transfer these technologies to U.S. industry through existing and expanded relationships.

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