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This Solicitation opportunity from Department Of Defense was posted on January 26, 2024. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Request for Solutions (RFS) Advanced Electrochromic Manufacturing Prototype Project

Closed
W900KK-24-R-9001Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

Active Opportunities Like This One

NAICS: 541713
SBIR / STTR
Development of Ultrafast Nonvolatile Memory Based on Sliding Ferroelectricity in Moiré Polar Homostructures
Solicitation # OSW26TZ06-NV005
Solicitation OSW26TZ06-NV005, issued by the Office of the Secretary of Defense, seeks the development of ultrafast, high-endurance, nonvolatile memory technology utilizing sliding ferroelectricity in polar moiré van der Waals homostructures. The objective is to create memory devices that outperform current technologies in speed, endurance, and scalability by leveraging engineered nanoscale polar domains. The project aims for dual-use applications, specifically targeting edge computing, neuromorphic computing, and radiation-tolerant electronics. Performance will be measured by switching speed, switching energy, endurance, retention, readout fidelity, and device-to-device reproducibility. This is a total small business set-aside under the SBIR/STTR mandate for companies with fewer than 500 employees. The contract is structured in phases, with a Phase II base period of 10 to 12 months not to exceed 1,000,000 dollars, and an optional period of 10 to 12 months for an additional 1,000,000 dollars. Awardees may also request up to 50,000 dollars in Discretionary Technical and Business Assistance. Proposals must be submitted via the Defense SBIR/STTR Innovation Portal by October 21, 2026, and will be evaluated based on technical merit, innovation, investigator qualifications, and commercialization potential. Compliance with CMMC and DFARS cybersecurity standards is required to safeguard federal contract information.
Office of the Secretary of Defense

POSTED

about 2 months ago

DEADLINE

in about 13 hours
NAICS: 541713
SBIR / STTR
Engineered Microstructures for Enhanced IR Aperture Performance
Solicitation # OSW26BZ06-NV024
The Office of the Secretary of Defense, through the Office of the Secretary of War, is soliciting proposals under the Small Business Innovation Research program for the development of engineered microstructures to enhance infrared aperture performance. The project seeks innovative powder synthesis and consolidation methods to produce IR-transparent composite ceramics at a scale exceeding 2 by 4 by 0.5 inches, with a long-term goal of producing components in the 3 by 9 inch range or larger. To be suitable for transition, the material must achieve sub-100 nm microstructural features in all phases, porosity below 0.1 percent, and Short-Wave to Mid-Wave Infrared transparency of at least 80 percent. Additionally, the composite must maintain these properties after exposure to 1200 degrees Celsius for 10 minutes and meet a thermal expansion to thermal conductivity ratio of 1.0 micrometers per Watt or less at 1000 degrees Celsius, with a target of 0.5 micrometers per Watt. This solicitation, numbered OSW26BZ06-NV024, is set aside for Small Business Concerns and offers a Phase I base value of 300,000 dollars over a 12-month period of performance, with potential additional TABA funding up to 6,500 dollars. Proposals must be submitted via the Defense SBIR STTR Innovation Portal by October 21, 2026, and must include seven specific volumes covering technical, cost, commercialization, and disclosure data. Awardees are required to maintain active registrations in SAM and the SBA Company Registry and must comply with DFARS 252.204-7012 for safeguarding covered defense information. The government will evaluate the work based on high professional standards, utilizing X-ray diffraction and scanning electron microscopy with energy dispersive spectroscopy to verify technical specifications.
Office of the Secretary of Defense

POSTED

about 2 months ago

DEADLINE

in about 13 hours
NAICS: 541713
SBIR / STTR
Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER)
Solicitation # DPA26TZ06-DV004
The Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER) project is a Small Business Technology Transfer (STTR) solicitation issued by the Defense Advanced Research Projects Agency (DARPA). The objective is to develop innovative nanofabrication hard-mask materials that overcome the physical limitations of current state-of-the-art inorganic films and sputtered metals. The goal is to enable the creation of extreme high-aspect-ratio structures, specifically targeting a 100:1 ratio, with minimal sidewall roughness and precise dimensional control. These materials are intended for use across various platforms, including semiconductor, photonic, MEMS, and quantum devices, and should be compatible with standard plasma fabrication tools such as RIE, ICP, and Bosch Deep RIE. This total small business set-aside opportunity offers a primary award value of 1,500,000 dollars over a 24-month period of performance, with an additional 12-month option valued at 450,000 dollars. Proposers may also be eligible for TABA funding of up to 6,500 dollars in Phase I and 50,000 dollars in Phase II. Proposals will be evaluated on their own individual merit based on technical merit, investigator qualifications, and commercial potential. Submissions must be made via the Defense Solutions Innovation Portal by October 21, 2026. Awardees must adhere to strict security requirements, including CMMC Level 2 self-assessment certification for those handling controlled unclassified information or ITAR-regulated work.
Defense Advanced Research Projects Agency

POSTED

about 2 months ago

DEADLINE

in about 13 hours
NAICS: 541713
SBIR / STTR
Monolithic Graphene–CMOS Broadband (UV-LWIR) Focal Plane Arrays for target detection in low-light conditions
Solicitation # OSW26BZ06-DV027
Solicitation OSW26BZ06-DV027 is a Small Business Innovation Research (SBIR) effort issued by the Office of the Secretary of Defense to develop a wafer-scale, monolithically integrated graphene-on-CMOS image sensor. The project aims to create a compact, low-power, uncooled focal plane array capable of broadband imaging from 300 nm to 10,000 nm (UV-LWIR) to enhance naval ISR target detection in low-light conditions. The primary technical objective is to retire risks associated with graphene material quality, high-yield back-end-of-line transfer, and absorber sensitization, with a specific performance goal of increasing integrated-device carrier mobility to approximately 10,000 cm²/V·s. This Direct to Phase II award has an estimated value of 2,000,000 dollars with a base period of performance of 24 months. Proposals will be evaluated based on technical approach, qualifications of key personnel, and commercial potential, with the contract likely taking the form of a Firm-Fixed-Price or Cost-Plus-Fixed-Fee agreement. Awardees must comply with strict cybersecurity and data safeguarding requirements, including R-DFARS 252.204-7012 and CMMC Phase I self-assessment standards. Submissions must be made via the DSIP portal and include comprehensive technical, cost, and commercialization volumes.
Office of the Secretary of Defense

POSTED

about 2 months ago

DEADLINE

in about 13 hours
NAICS: 541713
SBIR / STTR
Scalable Processing of Large Area, Oriented 2-Dimensional Polymer Films
Solicitation # OSW26TZ06-NV007
Solicitation OSW26TZ06-NV007, issued by the Office of the Secretary of Defense, seeks a scalable and cost-effective method to produce large-area, oriented 2-dimensional polymer (2DP) ensemble films, such as covalent organic frameworks. The primary objective is to overcome current processing limitations that result in insoluble powders or mechanically weak films by developing a process amenable to roll-to-roll manufacturing. The goal is to achieve high structural order and orientation of individual sheets perpendicular to the film plane while minimizing defects like pinholes and stacking errors. The project is structured in three phases: Phase I requires a continuous process producing films 1-50 microns thick at a rate of 100 feet per minute; Phase II aims to increase deposition rates by 2-5 times; and Phase III focuses on scaling to manufacturing-relevant levels with highly aligned domains. This is a Total Small Business Set-Aside under the STTR program, requiring proposing firms to be registered in SAM and the SBA Company Registry. Proposals must be submitted via the Defense SBIR/STTR Innovation Portal by October 21, 2026. Evaluation is based on technical merit, innovation, personnel qualifications, and commercialization potential, with technical soundness being the most important factor. Awardees must comply with strict cybersecurity standards, including CMMC and NIST SP 800-171/172, and provide an intellectual property agreement between the small business and its research partner. All work is expected to be performed at the unclassified level and is subject to government inspection to ensure high professional standards.
Office of the Secretary of Defense

POSTED

about 2 months ago

DEADLINE

in about 13 hours

General Info

NAICS

541713 - Research and Development in Nanotechnology

Place of Performance

FL, USA

Set-Aside

NONE

Documents

14

Advanced Electrochromic Manufacturing Prototype Project Amendment 2

PDF, High priority: read this firstamendment
High

Advanced Electrochromic Manufacturing Prototype Project - Amendment 3

PDF, High priority: read this firstamendment
High

Advanced Electrochromic Manufacturing Prototype Project - Amendment 4

PDF, High priority: read this firstamendment
High

Advanced Electrochromic Manufacturing Prototype Project - Sample SOW

DOCX, High priority: read this firstsow
High

Attachment 2: Data Rights and Computer Software License Terms and Definitions

PDF, High priority: read this firstspecifications
High

Attachment 3: Data Rights Assertions Tables

DOCX, High priority: read this firstsupporting-documents
High

Attachment 4: Terms and Conditions and EULA

PDF, High priority: read this firstcontract-document
High

Attachment 6: Section 889 Telecommunications Representation

PDF, High priority: read this firstrepresentation
High

Questions and Answers Amendment 03 - Advanced Electrochromic Prototype

PDF, High priority: read this firstq-and-a
High

Advanced Electrochromic Manufacturing Prototype Project - Vendor Questions Form

XLSX, Low priorityq-and-a
Low

Advanced Electrochromic Prototype Q&A

PDF, Low priorityq-and-a
Low

PEO STRI Vendor/Contractor Vetting Process

PDF, Low priorityspecial-notice
Low

Vendor Self-Vetting Form

PDF, Low prioritysecurity-vetting-form
Low

Att+1_Security+Vetting+for+Contractors.pdf

PDF

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Timeline

5 updates
PhaseClosed
Posted

special-notice

Notice updated

Notice type changed from Special Notice to Solicitation. Response deadline changed from Jan 8, 2024 to Jan 17, 2024. The notice title changed. The notice description changed.

Notice updated

Response deadline changed from Jan 17, 2024 to Jan 16, 2024. The notice description changed.

Notice updated

Response deadline changed from Jan 16, 2024 to Jan 31, 2024. The notice description changed.

Notice updated

The notice description changed.

Notice updated

The notice description changed.

Response Deadline

Deadline has passed

Submission Closed

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Organization & Contact Information

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AgencyDepartment Of Defense → W6QK Acc-Orlando
Contacts2 people available
OfficeORLANDO, FL, 32826-3224, USA
Office AddressORLANDO, FL, 32826-3224, USA

Full Description

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This FINAL Advanced Electrochromic Manufacturing Prototype Project Request for Solutions (RFS) is seeking vendors for an Other Transaction Authority (OTA) agreement. This FINAL RFS has been revised from the DRAFT version. The Government will evaluate the solution with the intent to competitively award one OT agreement as a result of this RFS. If the Government determines that more than one solution is in the best interest of the Government, more than one award may be made. ***FINAL RFS Solutions ARE being requested.*** This RFS requires the ability to Develop prototypes of single piece electronically dimmable eyewear protection device (EDEPD) for eye protection gear (goggles, glasses, or helmet visors) with mature electrochromic technology. Demonstrate the Manufacturing Capabilities and Processes using US-based Qualified Sources of Supplies. The Advanced Electrochromic Manufacturing Prototype Project is to be satisfied by industry partners with the ability to meet the eligibility requirements of 10 U.S.C. - 4022(d)(1). Question respondents are advised that the U.S. Government will not pay for any information or administrative costs incurred in the submission of questions to this FINAL RFS; all costs associated with question submissions to this FINAL RFS will be solely at the respondent's expense. Questions to this FINAL RFS must be submitted to jaime.morrison.civ@army.mil, using Attachment 5 Vendor Questions Form. A closing date for questions is identified in the Final RFS. Please note, this RFS is not associated with the Cornerstone Consortium and is being issued through a collaborative effort between Industrial Base Analysis and Sustainment (IBAS) program, Program Executive Office (PEO) for Simulation, Training, & Instrumentation (STRI) and Army Contracting Command (ACC) - Orlando. Note1: Amendment 01- has been issued to correct/update dates within the Final RFS. Note2: Amendment 02-has been issued in response to Questions and Answers. Amendment 02 also includes Questions and Answers. Note3: Amendment 03- has been issued in response to Questions and Answers and to correct/update information within the Final RFS. Please see new updated Questions and Answers sheet and Amended Final RFS dated 10 Jan 2024. Note4: Amendment 04- has been issued to correct/update Attachment 1 (Security Vetting for Contractors) and replace with Attachment 1 (Vendor vetting process) and Attachment 1a (Vendor Self Vetting Form). Please fill out and update these new forms accordingly and add to your RFS package responses. As a result of these updates the RFS has been updated.

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